A Perspective of Gate-Leakage Reduction in Deep Sub-Micron Ics
نویسندگان
چکیده
Before the CMOS process is scaled into deep sub-micron process, dynamic energy loss has always dominated power dissipation, while leakage power is little. The aggressive scaling of device dimensions and threshold voltage has significantly increased leakage current exponentially, thus the MOS devices will no longer be totally turned-off anymore. The power dissipation caused by leakage current can’t be neglected anymore, which attracts extensive attentions. Based on the fact that PMOS transistors have an order of magnitude smaller gate leakage than NMOS ones, it is used for designing circuit for reducing gate leakage power. Series of iterative steps are carried out to find the design perspective effect in different technologies.
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